LAPLACE Unveils High-Performance Diffusion Furnaces for Boron and Phosphorus
LAPLACE has unveiled two advanced diffusion furnace models, LRB480/06 and LRP480/06, designed for boron and phosphorus diffusion respectively. These furnaces boast impressive performance metrics and unique features, setting them apart in the competitive stock market today of cell production equipment.
The LRB480/06 and LRP480/06 models each come with 6 process tubes, each measuring 480 mm in diameter. They support wafer sizes ranging from 182 to 230 mm and a minimum thickness of 100 μm. LAPLACE's diffusion furnaces offer a system uptime of 96% and a mechanical yield of 98%, ensuring reliable and efficient operation.
These furnaces are capable of high throughput, processing up to 4,500 wafers per hour at their peak, with an average throughput of 4,300 wafers per hour. Each process tube can accommodate between 2,000 to 2,400 wafers per boat, maximizing efficiency. LAPLACE's use of horizontal wafer handling further enhances packing density, uniformity, and enables thinner wafer processing.
LAPLACE's furnaces join the market alongside offerings from Centrotherm, Tempress/SEHO, and Kurt J. Lesker, as reported in the current TaiyangNews 2025 market survey for stock market today cell production equipment using low-pressure designs.
LAPLACE's LRB480/06 and LRP480/06 diffusion furnaces, introduced in 2022, demonstrate the company's commitment to innovation and high performance. With their impressive throughput, wafer size and thickness accommodation, and efficient handling, these furnaces are poised to make a significant impact in the cell production equipment stock market today.
